At present, one of the research hotspots is the development of novel nanofabrication technnology. It is one of the important questions which must be solved in the application of nanotechology, esp. nano devices. The development request of nanodevices trends to the dimension miniaturization, the structure diversification, the high integration, which the nanometer processing resolution is not only needed, but also the complex nanometer structure processing and the naodevices preparation from two dimension to three dimension. Internationally nanofabrication resolution at 32 nm will be achievee in 2012 according to the semiconductor process technology's development map. The anticipated price for photoetching equipment will reach 50,000,000 US dollars. The existing photoetching technology becomes more and more complex, the equipment is getting more and more expensive. To a great extent, the reason is the used deep ultraviolet source and the immerse technology are constrained by linear optical principle category in photoetching, the breakthrough beyond optical diffraction limit principle has not been realized.

In this project the nanometer resolution fabrication beyond the optical diffraction limit will be realized by using visible and near-infrared laser as the processing laser source, which achieves the innovation and the breakthrough in photoetching principle by rembarking from the physical phenomenon and effect between the interactions of the light and the material. Firstly will be developed non-mask nanometer photoetching technology with high accuracy, large area, duplicated process, low cost, and diverse nanometer structure; Secondly will be developed the three dimensional nanometer structure process technology which can be achieved by planar photoetching, to prepare three dimensional nanometer structure of functional materials, to conducts the characteristic research on three dimensional nanometer component, to provide the scientific basis and the essential core technologies. This project's research work will benefit to develop the novel nanofabrication essential core technologies with proprietary intellectual property rights, to promote our country in nanofabrication with independent innovation ability, to satisify the significant demand on state economy developmental strategy, to promote our country nanotechnology application, and to enhance the development ability of correlated industry technology.